In Situ GISAXS Study of IZO Deposition via Magnetron Sputtering for Optoelectronic Devices: Film Growth and Ion Bombardment‐Induced Degradation Dynamics.

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Title: In Situ GISAXS Study of IZO Deposition via Magnetron Sputtering for Optoelectronic Devices: Film Growth and Ion Bombardment‐Induced Degradation Dynamics.
Authors: Zhong, Huaying1, Härtel, Marlene Sophie2, Chen, Wei3, Spanier, Lukas V.1, Yin, Shanshan4, Zhang, Jiahuan2, Seibertz, Bertwin Bilgrim Otto5, Szyszka, Bernd5, Albrecht, Steve2,5, Schwartzkopf, Matthias6, Roth, Stephan V.6,7, Müller‐Buschbaum, Peter1, muellerb@ph.tum.de
Source: Advanced Science; 1/27/2026, Vol. 13 Issue 5, p1-14, 14p
Database: Applied Science & Technology Source
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ISSN:21983844
DOI:10.1002/advs.202516853