Tong, T., Gao, Y., Long, Y., Liao, K., Chen, H., Lin, L., . . . Li, W. (2026). UV ozone oxidized high-k TaOx dielectric with van der Waals interface for two-dimensional electronic devices. Applied Physics Letters, 128(15), 1. https://doi.org/10.1063/5.0321761
Chicago Style (17th ed.) CitationTong, Tong, et al. "UV Ozone Oxidized High-k TaOx Dielectric with Van Der Waals Interface for Two-dimensional Electronic Devices." Applied Physics Letters 128, no. 15 (2026): 1. https://doi.org/10.1063/5.0321761.
MLA (9th ed.) CitationTong, Tong, et al. "UV Ozone Oxidized High-k TaOx Dielectric with Van Der Waals Interface for Two-dimensional Electronic Devices." Applied Physics Letters, vol. 128, no. 15, 2026, p. 1, https://doi.org/10.1063/5.0321761.