APA (7th ed.) Citation

Yokoyama, Y., Kawamura, M., & Kiba, T. (2026). Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior. Journal of Electronic Materials, 55(6), 4926. https://doi.org/10.1007/s11664-026-12846-6

Chicago Style (17th ed.) Citation

Yokoyama, Yamato, Midori Kawamura, and Takayuki Kiba. "Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior." Journal of Electronic Materials 55, no. 6 (2026): 4926. https://doi.org/10.1007/s11664-026-12846-6.

MLA (9th ed.) Citation

Yokoyama, Yamato, et al. "Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior." Journal of Electronic Materials, vol. 55, no. 6, 2026, p. 4926, https://doi.org/10.1007/s11664-026-12846-6.