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Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior.

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Bibliographic Details
Title: Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior.
Authors: Yokoyama, Yamato1, Kawamura, Midori1, kawamumd@mail.kitami-it.ac.jp, Kiba, Takayuki1
Source: Journal of Electronic Materials; Jun2026, Vol. 55 Issue 6, p4926-4931, 6p
Database: Applied Science & Technology Source
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