View in EDS

Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects.

Saved in:
Bibliographic Details
Title: Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects.
Authors: Shen, Hao1,2,3, Zhang, Libin1,2,3, zhanglibin@ime.ac.cn, Wang, Jiashuo1,2,3, Rui, Dinghai1,2,3, Su, Yajuan1,2,3, Wei, Yayi1,2,3, zhanglibin@ime.ac.cn
Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2026, Vol. 44 Issue 3, p1-10, 10p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 193810236
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Shen%2C+Hao%22">Shen, Hao</searchLink><relatesTo>1,2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Libin%22">Zhang, Libin</searchLink><relatesTo>1,2,3</relatesTo>, <i>zhanglibin@ime.ac.cn</i><br /><searchLink fieldCode="AU" term="%22Wang%2C+Jiashuo%22">Wang, Jiashuo</searchLink><relatesTo>1,2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Rui%2C+Dinghai%22">Rui, Dinghai</searchLink><relatesTo>1,2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Su%2C+Yajuan%22">Su, Yajuan</searchLink><relatesTo>1,2,3</relatesTo><br /><searchLink fieldCode="AU" term="%22Wei%2C+Yayi%22">Wei, Yayi</searchLink><relatesTo>1,2,3</relatesTo>, <i>zhanglibin@ime.ac.cn</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Nanotechnology+%26+Microelectronics%22">Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics</searchLink>; May2026, Vol. 44 Issue 3, p1-10, 10p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=193810236
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0005261
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 10
        StartPage: 1
    Titles:
      – TitleFull: Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Shen, Hao
      – PersonEntity:
          Name:
            NameFull: Zhang, Libin
      – PersonEntity:
          Name:
            NameFull: Wang, Jiashuo
      – PersonEntity:
          Name:
            NameFull: Rui, Dinghai
      – PersonEntity:
          Name:
            NameFull: Su, Yajuan
      – PersonEntity:
          Name:
            NameFull: Wei, Yayi
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-print
              Value: 21662746
          Numbering:
            – Type: volume
              Value: 44
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics
              Type: main
ResultId 1