Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.
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| Title: | Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†. |
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| Authors: | Li, Hao1, Peng, Rongrong1, Liu, Zhuoran1, Lian, Peng1, Chen, Jinping1, chenjp@mail.ipc.ac.cn, Yu, Tianjun1, Zeng, Yi1, Wang, Shuangqing2, Guo, Xudong2, Hu, Rui2, Yang, Guoqiang2, gqyang@iccas.ac.cn, Li, Yi1, yili@mail.ipc.ac.cn |
| Source: | Chinese Journal of Chemistry; Jul2026, Vol. 44 Issue 13, p2175-2201, 27p |
| Database: | Applied Science & Technology Source |
| ISSN: | 1001604X |
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| DOI: | 10.1002/cjoc.70573 |
