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Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.

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Title: Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.
Authors: Li, Hao1, Peng, Rongrong1, Liu, Zhuoran1, Lian, Peng1, Chen, Jinping1, chenjp@mail.ipc.ac.cn, Yu, Tianjun1, Zeng, Yi1, Wang, Shuangqing2, Guo, Xudong2, Hu, Rui2, Yang, Guoqiang2, gqyang@iccas.ac.cn, Li, Yi1, yili@mail.ipc.ac.cn
Source: Chinese Journal of Chemistry; Jul2026, Vol. 44 Issue 13, p2175-2201, 27p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 194204622
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.
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  Data: <searchLink fieldCode="AU" term="%22Li%2C+Hao%22">Li, Hao</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Peng%2C+Rongrong%22">Peng, Rongrong</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Liu%2C+Zhuoran%22">Liu, Zhuoran</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Lian%2C+Peng%22">Lian, Peng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Chen%2C+Jinping%22">Chen, Jinping</searchLink><relatesTo>1</relatesTo>, <i>chenjp@mail.ipc.ac.cn</i><br /><searchLink fieldCode="AU" term="%22Yu%2C+Tianjun%22">Yu, Tianjun</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Zeng%2C+Yi%22">Zeng, Yi</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Wang%2C+Shuangqing%22">Wang, Shuangqing</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Guo%2C+Xudong%22">Guo, Xudong</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Hu%2C+Rui%22">Hu, Rui</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Yang%2C+Guoqiang%22">Yang, Guoqiang</searchLink><relatesTo>2</relatesTo>, <i>gqyang@iccas.ac.cn</i><br /><searchLink fieldCode="AU" term="%22Li%2C+Yi%22">Li, Yi</searchLink><relatesTo>1</relatesTo>, <i>yili@mail.ipc.ac.cn</i>
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  Data: <searchLink fieldCode="JN" term="%22Chinese+Journal+of+Chemistry%22">Chinese Journal of Chemistry</searchLink>; Jul2026, Vol. 44 Issue 13, p2175-2201, 27p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=194204622
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1002/cjoc.70573
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      – Code: eng
        Text: English
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        PageCount: 27
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      – TitleFull: Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†.
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            NameFull: Li, Hao
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            NameFull: Peng, Rongrong
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            NameFull: Liu, Zhuoran
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            – D: 01
              M: 07
              Text: Jul2026
              Type: published
              Y: 2026
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              Value: 1001604X
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              Value: 44
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              Value: 13
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            – TitleFull: Chinese Journal of Chemistry
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