APA (7th ed.) Citation

Wang, D., Zhang, Y., Xu, F., Wang, X., Lu, Z., Fu, H., & He, D. (2026). Enhanced Ferroelectricity and Reliability in Hf0.5Zr0.5O2 Thin Film via Synergistic Stress-Interface Effects from a W Top Electrode. Journal of Electronic Materials, 55(7), 5807. https://doi.org/10.1007/s11664-026-12815-z

Chicago Style (17th ed.) Citation

Wang, Dao, Yan Zhang, Fan Xu, Xin-Yuan Wang, Zi-Hao Lu, Hui-Wen Fu, and Dan-Feng He. "Enhanced Ferroelectricity and Reliability in Hf0.5Zr0.5O2 Thin Film via Synergistic Stress-Interface Effects from a W Top Electrode." Journal of Electronic Materials 55, no. 7 (2026): 5807. https://doi.org/10.1007/s11664-026-12815-z.

MLA (9th ed.) Citation

Wang, Dao, et al. "Enhanced Ferroelectricity and Reliability in Hf0.5Zr0.5O2 Thin Film via Synergistic Stress-Interface Effects from a W Top Electrode." Journal of Electronic Materials, vol. 55, no. 7, 2026, p. 5807, https://doi.org/10.1007/s11664-026-12815-z.