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Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.

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Title: Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.
Authors: Chen, Pei-Tien1,2, Huang, Chien-Chi1,2, Lai, Yu-Wen1, Lin, Chung-Hsiang3, Lee, Kang-Yuan3, Li, Chia-Chen2, Chang, Chih-Ting2, Tsai, Chia-Jung1,2, Chen, Li-Yin1, Lee, Po-Tsung1, Hong, Yu-Heng2, enoch.yh.hong@foxconn.com, Lee, Tzu-Yi1,2, alexlee@nycu.edu.tw, Kuo, Hao-Chung1,2,4, hckuo0206@nycu.edu.tw
Source: Discover Nano; 9/21/2026, Vol. 21 Issue 1, p1-39, 39p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 197215126
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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        Value: 10.1186/s11671-026-04870-6
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              Text: 9/21/2026
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