Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch.
Saved in:
| Title: | Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch. |
|---|---|
| Authors: | Eih-Zhe Liang1, Chao-Jei Huang1, Ching-Fuh Lin1,2,3, cflin@cc.ee.ntu.edu.tw |
| Source: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Mar/Apr2006, Vol. 24 Issue 2, p599-603, 5p, 3 Black and White Photographs, 1 Diagram, 2 Graphs |
| Database: | Applied Science & Technology Source |
| ISSN: | 10711023 |
|---|---|
| DOI: | 10.1116/1.2172251 |
