Kallesøe, C., Mølhave, K., Larsen, K. F., Engstrøm, D., Hansen, T. M., Bøggild, P., . . . Samuelson, L. (2010). Integration, gap formation, and sharpening of III-V heterostructure nanowires by selective etching. Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 28(1), 21. https://doi.org/10.1116/1.3268135
Chicago Style (17th ed.) CitationKallesøe, Christian, Kristian Mølhave, Kasper F. Larsen, Daniel Engstrøm, Torben M. Hansen, Peter Bøggild, Thomas Mårtensson, Magnus Borgström, and Lars Samuelson. "Integration, Gap Formation, and Sharpening of III-V Heterostructure Nanowires by Selective Etching." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics 28, no. 1 (2010): 21. https://doi.org/10.1116/1.3268135.
MLA (9th ed.) CitationKallesøe, Christian, et al. "Integration, Gap Formation, and Sharpening of III-V Heterostructure Nanowires by Selective Etching." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, vol. 28, no. 1, 2010, p. 21, https://doi.org/10.1116/1.3268135.