APA (7th ed.) Citation

Rausch, N., & Burte, E. P. (1993). Thin TiO2 films prepared by low pressure chemical vapor deposition. Journal of the Electrochemical Society, 140, 145. https://doi.org/10.1149/1.2056076

Chicago Style (17th ed.) Citation

Rausch, N., and E. P. Burte. "Thin TiO2 Films Prepared by Low Pressure Chemical Vapor Deposition." Journal of the Electrochemical Society 140 (1993): 145. https://doi.org/10.1149/1.2056076.

MLA (9th ed.) Citation

Rausch, N., and E. P. Burte. "Thin TiO2 Films Prepared by Low Pressure Chemical Vapor Deposition." Journal of the Electrochemical Society, vol. 140, 1993, p. 145, https://doi.org/10.1149/1.2056076.