Thin TiO2 films prepared by low pressure chemical vapor deposition.

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Bibliographic Details
Title: Thin TiO2 films prepared by low pressure chemical vapor deposition.
Authors: Rausch, N., Burte, E. P.
Source: Journal of the Electrochemical Society; January 1993, Vol. 140, p145-149, 5p
Database: Applied Science & Technology Source
Description
ISSN:00134651
DOI:10.1149/1.2056076