Thin TiO2 films prepared by low pressure chemical vapor deposition.
Saved in:
| Title: | Thin TiO2 films prepared by low pressure chemical vapor deposition. |
|---|---|
| Authors: | Rausch, N., Burte, E. P. |
| Source: | Journal of the Electrochemical Society; January 1993, Vol. 140, p145-149, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
|---|---|
| DOI: | 10.1149/1.2056076 |