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Thin TiO2 films prepared by low pressure chemical vapor deposition.

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Title: Thin TiO2 films prepared by low pressure chemical vapor deposition.
Authors: Rausch, N., Burte, E. P.
Source: Journal of the Electrochemical Society; January 1993, Vol. 140, p145-149, 5p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: <searchLink fieldCode="AU" term="%22Rausch%2C+N%2E%22">Rausch, N.</searchLink><br /><searchLink fieldCode="AU" term="%22Burte%2C+E%2E+P%2E%22">Burte, E. P.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; January 1993, Vol. 140, p145-149, 5p
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        Value: 10.1149/1.2056076
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 145
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      – TitleFull: Thin TiO2 films prepared by low pressure chemical vapor deposition.
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            NameFull: Rausch, N.
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              Text: January 1993
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              Y: 1993
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              Value: 140
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