The reactive sputtering of thin films of TiN at low target voltages.
Saved in:
| Title: | The reactive sputtering of thin films of TiN at low target voltages. |
|---|---|
| Authors: | Swady, R. A., Ja'fer, H. A., Howson, R. P. |
| Source: | Vacuum; March-April 1993, Vol. 44, p297-301, 5p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
|---|---|
| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 500095809 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: The reactive sputtering of thin films of TiN at low target voltages. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Swady%2C+R%2E+A%2E%22">Swady, R. A.</searchLink><br /><searchLink fieldCode="AU" term="%22Ja'fer%2C+H%2E+A%2E%22">Ja'fer, H. A.</searchLink><br /><searchLink fieldCode="AU" term="%22Howson%2C+R%2E+P%2E%22">Howson, R. P.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Vacuum%22">Vacuum</searchLink>; March-April 1993, Vol. 44, p297-301, 5p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500095809 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/0042-207X(93)90173-8 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 5 StartPage: 297 Titles: – TitleFull: The reactive sputtering of thin films of TiN at low target voltages. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Swady, R. A. – PersonEntity: Name: NameFull: Ja'fer, H. A. – PersonEntity: Name: NameFull: Howson, R. P. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 03 Text: March-April 1993 Type: published Y: 1993 Identifiers: – Type: issn-print Value: 0042207X Numbering: – Type: volume Value: 44 Titles: – TitleFull: Vacuum Type: main |
| ResultId | 1 |
