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Application of reflectance difference to monitor GaAs wet etching.

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Bibliographic Details
Title: Application of reflectance difference to monitor GaAs wet etching.
Authors: Deppert, Knut, Jönsson, Jan, Samuelson, Lars
Source: Semiconductor Science & Technology; May 1994, Vol. 9 Issue 5, p1148-1152, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500134375
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Application of reflectance difference to monitor GaAs wet etching.
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  Data: <searchLink fieldCode="JN" term="%22Semiconductor+Science+%26+Technology%22">Semiconductor Science & Technology</searchLink>; May 1994, Vol. 9 Issue 5, p1148-1152, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500134375
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1088/0268-1242/9/5/022
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 1148
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      – TitleFull: Application of reflectance difference to monitor GaAs wet etching.
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            NameFull: Deppert, Knut
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            NameFull: Jönsson, Jan
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            NameFull: Samuelson, Lars
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            – D: 01
              M: 05
              Text: May 1994
              Type: published
              Y: 1994
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            – TitleFull: Semiconductor Science & Technology
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