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On-line inference of plasma etch uniformity using in situ ellipsometry.

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Bibliographic Details
Title: On-line inference of plasma etch uniformity using in situ ellipsometry.
Authors: Stefani, Jerry, Butler, Stephanie Watts
Source: Journal of the Electrochemical Society; May 1994, Vol. 141, p1387-1391, 5p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: On-line inference of plasma etch uniformity using in situ ellipsometry.
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  Data: <searchLink fieldCode="AU" term="%22Stefani%2C+Jerry%22">Stefani, Jerry</searchLink><br /><searchLink fieldCode="AU" term="%22Butler%2C+Stephanie+Watts%22">Butler, Stephanie Watts</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; May 1994, Vol. 141, p1387-1391, 5p
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1149/1.2054930
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 1387
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      – TitleFull: On-line inference of plasma etch uniformity using in situ ellipsometry.
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            NameFull: Stefani, Jerry
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            NameFull: Butler, Stephanie Watts
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          Dates:
            – D: 01
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              Text: May 1994
              Type: published
              Y: 1994
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              Value: 141
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            – TitleFull: Journal of the Electrochemical Society
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