On-line inference of plasma etch uniformity using in situ ellipsometry.
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| Title: | On-line inference of plasma etch uniformity using in situ ellipsometry. |
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| Authors: | Stefani, Jerry, Butler, Stephanie Watts |
| Source: | Journal of the Electrochemical Society; May 1994, Vol. 141, p1387-1391, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2054930 |
