APA (7th ed.) Citation

Chang, L., Cowden, W. G., & Christiansen, J. (1996). Is Ti contamination in Si wafer processing an issue? Journal of the Electrochemical Society, 143, 2353. https://doi.org/10.1149/1.1837006

Chicago Style (17th ed.) Citation

Chang, Li-Hsin, William G. Cowden, and Jim Christiansen. "Is Ti Contamination in Si Wafer Processing an Issue?" Journal of the Electrochemical Society 143 (1996): 2353. https://doi.org/10.1149/1.1837006.

MLA (9th ed.) Citation

Chang, Li-Hsin, et al. "Is Ti Contamination in Si Wafer Processing an Issue?" Journal of the Electrochemical Society, vol. 143, 1996, p. 2353, https://doi.org/10.1149/1.1837006.