Xirouchaki, C., Moschovis, K., & Chatzitheodoridis, E. (1999). Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering. Journal of Electronic Materials, 28(1), 26. https://doi.org/10.1007/s11664-999-0190-z
Chicago Style (17th ed.) CitationXirouchaki, C., K. Moschovis, and E. Chatzitheodoridis. "Structural and Chemical Characterization of As-deposited Microcrystalline Indium Oxide Films Prepared by Dc Reactive Magnetron Sputtering." Journal of Electronic Materials 28, no. 1 (1999): 26. https://doi.org/10.1007/s11664-999-0190-z.
MLA (9th ed.) CitationXirouchaki, C., et al. "Structural and Chemical Characterization of As-deposited Microcrystalline Indium Oxide Films Prepared by Dc Reactive Magnetron Sputtering." Journal of Electronic Materials, vol. 28, no. 1, 1999, p. 26, https://doi.org/10.1007/s11664-999-0190-z.