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Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering.

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Title: Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering.
Authors: Xirouchaki, C., Moschovis, K., Chatzitheodoridis, E.
Source: Journal of Electronic Materials; January 1999, Vol. 28 Issue 1, p26-34, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500471691
AccessLevel: 2
PubType: Academic Journal
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  Data: Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering.
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  Data: <searchLink fieldCode="AU" term="%22Xirouchaki%2C+C%2E%22">Xirouchaki, C.</searchLink><br /><searchLink fieldCode="AU" term="%22Moschovis%2C+K%2E%22">Moschovis, K.</searchLink><br /><searchLink fieldCode="AU" term="%22Chatzitheodoridis%2C+E%2E%22">Chatzitheodoridis, E.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Electronic+Materials%22">Journal of Electronic Materials</searchLink>; January 1999, Vol. 28 Issue 1, p26-34, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500471691
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      – Type: doi
        Value: 10.1007/s11664-999-0190-z
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 26
    Titles:
      – TitleFull: Structural and chemical characterization of as-deposited microcrystalline indium oxide films prepared by dc reactive magnetron sputtering.
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            NameFull: Xirouchaki, C.
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            NameFull: Moschovis, K.
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            NameFull: Chatzitheodoridis, E.
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            – D: 01
              M: 01
              Text: January 1999
              Type: published
              Y: 1999
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              Value: 28
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