Kinetics of arsenic segregation at grain boundaries in polycrystalline silicon.
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| Title: | Kinetics of arsenic segregation at grain boundaries in polycrystalline silicon. |
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| Authors: | Nédédlec, Sophie, Mathiot, Daniel |
| Source: | Semiconductor Science & Technology; November 1997, Vol. 12, p1438-1445, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 02681242 |
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