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Kinetics of arsenic segregation at grain boundaries in polycrystalline silicon.

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Bibliographic Details
Title: Kinetics of arsenic segregation at grain boundaries in polycrystalline silicon.
Authors: Nédédlec, Sophie, Mathiot, Daniel
Source: Semiconductor Science & Technology; November 1997, Vol. 12, p1438-1445, 8p
Database: Applied Science & Technology Source
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