The CVD growth of Cu films using H2 as carrier gas.

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Bibliographic Details
Title:	The CVD growth of Cu films using H2 as carrier gas.
Authors:	Lin, Pi-Jiun, Chen, Mao-Chieh
Source:	Journal of Electronic Materials; May 1999, Vol. 28 Issue 5, p567-571, 5p
Database:	Applied Science & Technology Source

Description
ISSN:	03615235
DOI:	10.1007/s11664-999-0114-y