APA (7th ed.) Citation

Hsu, K. C., & Koretsky, M. D. (2000). Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma. Journal of the Electrochemical Society, 147(5), 1818. https://doi.org/10.1149/1.1393440

Chicago Style (17th ed.) Citation

Hsu, Kevin C., and Milo D. Koretsky. "Surface Kinetics of Polyphenylene Oxide Etching in a CF4/O2/Ar Downstream Microwave Plasma." Journal of the Electrochemical Society 147, no. 5 (2000): 1818. https://doi.org/10.1149/1.1393440.

MLA (9th ed.) Citation

Hsu, Kevin C., and Milo D. Koretsky. "Surface Kinetics of Polyphenylene Oxide Etching in a CF4/O2/Ar Downstream Microwave Plasma." Journal of the Electrochemical Society, vol. 147, no. 5, 2000, p. 1818, https://doi.org/10.1149/1.1393440.