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Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.

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Bibliographic Details
Title: Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.
Authors: Hsu, Kevin C., Koretsky, Milo D.
Source: Journal of the Electrochemical Society; May 2000, Vol. 147 Issue 5, p1818-1824, 7p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500680216
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.
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  Data: <searchLink fieldCode="AU" term="%22Hsu%2C+Kevin+C%2E%22">Hsu, Kevin C.</searchLink><br /><searchLink fieldCode="AU" term="%22Koretsky%2C+Milo+D%2E%22">Koretsky, Milo D.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; May 2000, Vol. 147 Issue 5, p1818-1824, 7p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500680216
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      – Type: doi
        Value: 10.1149/1.1393440
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 1818
    Titles:
      – TitleFull: Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.
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            NameFull: Hsu, Kevin C.
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            NameFull: Koretsky, Milo D.
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              Text: May 2000
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              Y: 2000
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              Value: 147
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            – TitleFull: Journal of the Electrochemical Society
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