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Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.

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Bibliographic Details
Title: Surface kinetics of polyphenylene oxide etching in a CF4/O2/Ar downstream microwave plasma.
Authors: Hsu, Kevin C., Koretsky, Milo D.
Source: Journal of the Electrochemical Society; May 2000, Vol. 147 Issue 5, p1818-1824, 7p
Database: Applied Science & Technology Source
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