Planar reactor plasma etching with barrel reactor power supply.

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Bibliographic Details
Title:	Planar reactor plasma etching with barrel reactor power supply.
Authors:	Setzer, C. S., Mattauch, R. J.
Source:	Review of Scientific Instruments; May85, Vol. 56 Issue 2, p761-763, 3p
Database:	Applied Science & Technology Source

Description
ISSN:	00346748
DOI:	10.1063/1.1138167