Planar reactor plasma etching with barrel reactor power supply.
Saved in:
| Title: | Planar reactor plasma etching with barrel reactor power supply. |
|---|---|
| Authors: | Setzer, C. S., Mattauch, R. J. |
| Source: | Review of Scientific Instruments; May85, Vol. 56 Issue 2, p761-763, 3p |
| Database: | Applied Science & Technology Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
|---|---|
| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 500787715 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: Planar reactor plasma etching with barrel reactor power supply. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Setzer%2C+C%2E+S%2E%22">Setzer, C. S.</searchLink><br /><searchLink fieldCode="AU" term="%22Mattauch%2C+R%2E+J%2E%22">Mattauch, R. J.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Review+of+Scientific+Instruments%22">Review of Scientific Instruments</searchLink>; May85, Vol. 56 Issue 2, p761-763, 3p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500787715 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.1138167 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 3 StartPage: 761 Titles: – TitleFull: Planar reactor plasma etching with barrel reactor power supply. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Setzer, C. S. – PersonEntity: Name: NameFull: Mattauch, R. J. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May85 Type: published Y: 1985 Identifiers: – Type: issn-print Value: 00346748 Numbering: – Type: volume Value: 56 – Type: issue Value: 2 Titles: – TitleFull: Review of Scientific Instruments Type: main |
| ResultId | 1 |
