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Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O3 thin films at low temperatures for high-density ferroelectric memory applications.

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Title: Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O3 thin films at low temperatures for high-density ferroelectric memory applications.
Authors: Kim, Hye Ryoung, Jeong, Seehwa, Jeon, Chung Bae
Source: Journal of Materials Research; December 2001, Vol. 16 Issue 12, p3583-3591, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500843242
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O3 thin films at low temperatures for high-density ferroelectric memory applications.
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  Data: <searchLink fieldCode="AU" term="%22Kim%2C+Hye+Ryoung%22">Kim, Hye Ryoung</searchLink><br /><searchLink fieldCode="AU" term="%22Jeong%2C+Seehwa%22">Jeong, Seehwa</searchLink><br /><searchLink fieldCode="AU" term="%22Jeon%2C+Chung+Bae%22">Jeon, Chung Bae</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Research%22">Journal of Materials Research</searchLink>; December 2001, Vol. 16 Issue 12, p3583-3591, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500843242
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1557/JMR.2001.0491
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      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 3583
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      – TitleFull: Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O3 thin films at low temperatures for high-density ferroelectric memory applications.
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            NameFull: Kim, Hye Ryoung
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            NameFull: Jeong, Seehwa
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            NameFull: Jeon, Chung Bae
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              M: 12
              Text: December 2001
              Type: published
              Y: 2001
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              Value: 12
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