APA (7th ed.) Citation

Fan, C., Chen, M., & Chang, Y. (2003). A Novel Two-Step Annealing Technique for the Fabrication of High Performance Low Temperature Poly-Si TFTs. Journal of the Electrochemical Society, 150(8), H178. https://doi.org/10.1149/1.1590997

Chicago Style (17th ed.) Citation

Fan, Ching-Lin, Mao-Chieh Chen, and Yih Chang. "A Novel Two-Step Annealing Technique for the Fabrication of High Performance Low Temperature Poly-Si TFTs." Journal of the Electrochemical Society 150, no. 8 (2003): H178. https://doi.org/10.1149/1.1590997.

MLA (9th ed.) Citation

Fan, Ching-Lin, et al. "A Novel Two-Step Annealing Technique for the Fabrication of High Performance Low Temperature Poly-Si TFTs." Journal of the Electrochemical Society, vol. 150, no. 8, 2003, p. H178, https://doi.org/10.1149/1.1590997.