APA (7th ed.) Citation

Spadafora, M., Privitera, G., & Terrasi, A. (2003). Oxidation rate enhancement of SiGe epitaxial films oxidized in dry ambient. Applied Physics Letters, 83(18), 3713. https://doi.org/10.1063/1.1622439

Chicago Style (17th ed.) Citation

Spadafora, M., G. Privitera, and A. Terrasi. "Oxidation Rate Enhancement of SiGe Epitaxial Films Oxidized in Dry Ambient." Applied Physics Letters 83, no. 18 (2003): 3713. https://doi.org/10.1063/1.1622439.

MLA (9th ed.) Citation

Spadafora, M., et al. "Oxidation Rate Enhancement of SiGe Epitaxial Films Oxidized in Dry Ambient." Applied Physics Letters, vol. 83, no. 18, 2003, p. 3713, https://doi.org/10.1063/1.1622439.