Electron drift in C4F6 and C4F6/Ar mixtures.

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Title: Electron drift in C4F6 and C4F6/Ar mixtures.
Authors: Goyette, A. N., Wang, Yicheng, FitzPatrick, G. J.
Source: Journal of Applied Physics; September 1 2002, Vol. 92 Issue 5, p2948-2949, 2p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500918552
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Electron drift in C4F6 and C4F6/Ar mixtures.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; September 1 2002, Vol. 92 Issue 5, p2948-2949, 2p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500918552
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.1497447
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 2
        StartPage: 2948
    Titles:
      – TitleFull: Electron drift in C4F6 and C4F6/Ar mixtures.
        Type: main
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            NameFull: Goyette, A. N.
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            NameFull: Wang, Yicheng
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            NameFull: FitzPatrick, G. J.
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            – D: 01
              M: 09
              Text: September 1 2002
              Type: published
              Y: 2002
          Identifiers:
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              Value: 00218979
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              Value: 92
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              Value: 5
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            – TitleFull: Journal of Applied Physics
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