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Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique.

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Bibliographic Details
Title: Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique.
Authors: Kim, J. B., Kwon, D. R., Chakrabarti, K.
Source: Journal of Applied Physics; December 1 2002, Vol. 92 Issue 11, p6739-6742, 4p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500960392
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique.
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  Data: <searchLink fieldCode="AU" term="%22Kim%2C+J%2E+B%2E%22">Kim, J. B.</searchLink><br /><searchLink fieldCode="AU" term="%22Kwon%2C+D%2E+R%2E%22">Kwon, D. R.</searchLink><br /><searchLink fieldCode="AU" term="%22Chakrabarti%2C+K%2E%22">Chakrabarti, K.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; December 1 2002, Vol. 92 Issue 11, p6739-6742, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500960392
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.1515951
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 4
        StartPage: 6739
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      – TitleFull: Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique.
        Type: main
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          Name:
            NameFull: Kim, J. B.
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            NameFull: Kwon, D. R.
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            NameFull: Chakrabarti, K.
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            – D: 01
              M: 12
              Text: December 1 2002
              Type: published
              Y: 2002
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              Value: 92
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              Value: 11
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            – TitleFull: Journal of Applied Physics
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