Oxygen diffusion in atomic layer deposited ZrO2 and HfO2 thin films on Si (100)
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| Title: | Oxygen diffusion in atomic layer deposited ZrO2 and HfO2 thin films on Si (100) |
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| Authors: | Ferrari, S., Scarel, G. |
| Source: | Journal of Applied Physics; 7/1/2004, Vol. 96 Issue 1, p144-149, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1753080 |
