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Pulsed-Laser Annealing, a Low-Thermal-Budget Technique for Eliminating Stress Gradient in Poly-SiGe MEMS Structures.

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Bibliographic Details
Title: Pulsed-Laser Annealing, a Low-Thermal-Budget Technique for Eliminating Stress Gradient in Poly-SiGe MEMS Structures.
Authors: Sedky, Sherif, Howe, Roger T., King, Tsu-Jac
Source: Journal of Microelectromechanical Systems; Aug2004, Vol. 13 Issue 4, p669-675, 7p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501022467
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Pulsed-Laser Annealing, a Low-Thermal-Budget Technique for Eliminating Stress Gradient in Poly-SiGe MEMS Structures.
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      – Type: doi
        Value: 10.1109/JMEMS.2004.832189
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 669
    Titles:
      – TitleFull: Pulsed-Laser Annealing, a Low-Thermal-Budget Technique for Eliminating Stress Gradient in Poly-SiGe MEMS Structures.
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            NameFull: Sedky, Sherif
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            NameFull: Howe, Roger T.
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            NameFull: King, Tsu-Jac
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              Text: Aug2004
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              Y: 2004
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