Jian, S., Fang, T., & Chuu, D. (2003). Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation. Journal of Electronic Materials, 32(6), 496. https://doi.org/10.1007/s11664-003-0132-0
Chicago Style (17th ed.) CitationJian, Sheng-Rui, Te-Hua Fang, and Der-San Chuu. "Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation." Journal of Electronic Materials 32, no. 6 (2003): 496. https://doi.org/10.1007/s11664-003-0132-0.
MLA (9th ed.) CitationJian, Sheng-Rui, et al. "Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation." Journal of Electronic Materials, vol. 32, no. 6, 2003, p. 496, https://doi.org/10.1007/s11664-003-0132-0.
Warning: These citations may not always be 100% accurate.