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Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation.

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Title: Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation.
Authors: Jian, Sheng-Rui, Fang, Te-Hua, Chuu, Der-San
Source: Journal of Electronic Materials; June 2003, Vol. 32 Issue 6, p496-500, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501043469
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation.
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  Data: <searchLink fieldCode="AU" term="%22Jian%2C+Sheng-Rui%22">Jian, Sheng-Rui</searchLink><br /><searchLink fieldCode="AU" term="%22Fang%2C+Te-Hua%22">Fang, Te-Hua</searchLink><br /><searchLink fieldCode="AU" term="%22Chuu%2C+Der-San%22">Chuu, Der-San</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Electronic+Materials%22">Journal of Electronic Materials</searchLink>; June 2003, Vol. 32 Issue 6, p496-500, 5p
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      – Type: doi
        Value: 10.1007/s11664-003-0132-0
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 496
    Titles:
      – TitleFull: Analysis of Physical Properties of III-Nitride Thin Films by Nanoindentation.
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            NameFull: Jian, Sheng-Rui
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            NameFull: Fang, Te-Hua
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            NameFull: Chuu, Der-San
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            – D: 01
              M: 06
              Text: June 2003
              Type: published
              Y: 2003
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              Value: 32
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