APA (7th ed.) Citation

Roper, C. S., Radmilovic, V., & Howe, R. T. (2006). Single-Source Chemical Vapor Deposition of SiC Films in a Large-Scale Low-Pressure CVD Growth, Chemical, and Mechanical Characterization Reactor. Journal of the Electrochemical Society, 153(8), C562. https://doi.org/10.1149/1.2208911

Chicago Style (17th ed.) Citation

Roper, Christopher S., Velimir Radmilovic, and Roger T. Howe. "Single-Source Chemical Vapor Deposition of SiC Films in a Large-Scale Low-Pressure CVD Growth, Chemical, and Mechanical Characterization Reactor." Journal of the Electrochemical Society 153, no. 8 (2006): C562. https://doi.org/10.1149/1.2208911.

MLA (9th ed.) Citation

Roper, Christopher S., et al. "Single-Source Chemical Vapor Deposition of SiC Films in a Large-Scale Low-Pressure CVD Growth, Chemical, and Mechanical Characterization Reactor." Journal of the Electrochemical Society, vol. 153, no. 8, 2006, p. C562, https://doi.org/10.1149/1.2208911.