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Single-Source Chemical Vapor Deposition of SiC Films in a Large-Scale Low-Pressure CVD Growth, Chemical, and Mechanical Characterization Reactor.

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Bibliographic Details
Title: Single-Source Chemical Vapor Deposition of SiC Films in a Large-Scale Low-Pressure CVD Growth, Chemical, and Mechanical Characterization Reactor.
Authors: Roper, Christopher S., Radmilovic, Velimir, Howe, Roger T.
Source: Journal of the Electrochemical Society; 2006, Vol. 153 Issue 8, pC562-C566, 5p
Database: Applied Science & Technology Source
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