Fan, C., & Yang, T. (2006). Effects of NH3 Plasma Pretreatment before Crystallization on Low-Temperature-Processed Poly-Si Thin-Film Transistors. Journal of the Electrochemical Society, 153(8), H161. https://doi.org/10.1149/1.2207000
Chicago Style (17th ed.) CitationFan, Ching-Lin, and Tsung-Hsien Yang. "Effects of NH3 Plasma Pretreatment Before Crystallization on Low-Temperature-Processed Poly-Si Thin-Film Transistors." Journal of the Electrochemical Society 153, no. 8 (2006): H161. https://doi.org/10.1149/1.2207000.
MLA (9th ed.) CitationFan, Ching-Lin, and Tsung-Hsien Yang. "Effects of NH3 Plasma Pretreatment Before Crystallization on Low-Temperature-Processed Poly-Si Thin-Film Transistors." Journal of the Electrochemical Society, vol. 153, no. 8, 2006, p. H161, https://doi.org/10.1149/1.2207000.