Lu2O3/Al2O3 gate dielectrics for germanium metal-oxide-semiconductor devices.
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| Title: | Lu2O3/Al2O3 gate dielectrics for germanium metal-oxide-semiconductor devices. |
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| Authors: | Darmawan, P., Chan, M. Y., Zhang, T. |
| Source: | Applied Physics Letters; August 11 2008, Vol. 93 Issue 6, p062901-062901, 1p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00036951 |
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