APA (7th ed.) Citation

Roper, C. S., Howe, R. T., & Maboudian, R. (2009). Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3. Journal of the Electrochemical Society, 156(3), D104. https://doi.org/10.1149/1.3061944

Chicago Style (17th ed.) Citation

Roper, Christopher S., Roger T. Howe, and Roya Maboudian. "Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3." Journal of the Electrochemical Society 156, no. 3 (2009): D104. https://doi.org/10.1149/1.3061944.

MLA (9th ed.) Citation

Roper, Christopher S., et al. "Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3." Journal of the Electrochemical Society, vol. 156, no. 3, 2009, p. D104, https://doi.org/10.1149/1.3061944.