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Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3.

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Bibliographic Details
Title: Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3.
Authors: Roper, Christopher S., Howe, Roger T., Maboudian, Roya
Source: Journal of the Electrochemical Society; 2009, Vol. 156 Issue 3, pD104-D107, 4p
Database: Applied Science & Technology Source
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