APA (7th ed.) Citation

Feng, L., & Liu, Z. (2009). Structural and electrical properties of thin SrHfON films for high-k gate dielectric. Applied Physics Letters, 94(25), 252907. https://doi.org/10.1063/1.3152779

Chicago Style (17th ed.) Citation

Feng, Li-ping, and Zheng-tang Liu. "Structural and Electrical Properties of Thin SrHfON Films for High-k Gate Dielectric." Applied Physics Letters 94, no. 25 (2009): 252907. https://doi.org/10.1063/1.3152779.

MLA (9th ed.) Citation

Feng, Li-ping, and Zheng-tang Liu. "Structural and Electrical Properties of Thin SrHfON Films for High-k Gate Dielectric." Applied Physics Letters, vol. 94, no. 25, 2009, p. 252907, https://doi.org/10.1063/1.3152779.