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Structural and electrical properties of thin SrHfON films for high-k gate dielectric.

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Title: Structural and electrical properties of thin SrHfON films for high-k gate dielectric.
Authors: Feng, Li-ping, Liu, Zheng-tang
Source: Applied Physics Letters; June 22 2009, Vol. 94 Issue 25, p252907-252907, 1p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501447952
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PubType: Academic Journal
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  Data: Structural and electrical properties of thin SrHfON films for high-k gate dielectric.
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  Data: <searchLink fieldCode="AU" term="%22Feng%2C+Li-ping%22">Feng, Li-ping</searchLink><br /><searchLink fieldCode="AU" term="%22Liu%2C+Zheng-tang%22">Liu, Zheng-tang</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Applied+Physics+Letters%22">Applied Physics Letters</searchLink>; June 22 2009, Vol. 94 Issue 25, p252907-252907, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501447952
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1063/1.3152779
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: 252907
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      – TitleFull: Structural and electrical properties of thin SrHfON films for high-k gate dielectric.
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            NameFull: Feng, Li-ping
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            NameFull: Liu, Zheng-tang
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              Text: June 22 2009
              Type: published
              Y: 2009
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              Value: 94
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