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Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.

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Title: Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.
Authors: Yang, K., Jiang, J. Q., Gu, M. Y.
Source: Materials Science & Technology; August 2007, Vol. 23 Issue 8, p958-962, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501459028
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.
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  Data: <searchLink fieldCode="AU" term="%22Yang%2C+K%2E%22">Yang, K.</searchLink><br /><searchLink fieldCode="AU" term="%22Jiang%2C+J%2E+Q%2E%22">Jiang, J. Q.</searchLink><br /><searchLink fieldCode="AU" term="%22Gu%2C+M%2E+Y%2E%22">Gu, M. Y.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+%26+Technology%22">Materials Science & Technology</searchLink>; August 2007, Vol. 23 Issue 8, p958-962, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501459028
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      – Type: doi
        Value: 10.1179/174328407X192859
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 958
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      – TitleFull: Effects of nitrogen partial pressure on microstructure, morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering.
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            NameFull: Yang, K.
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            NameFull: Jiang, J. Q.
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            – D: 01
              M: 08
              Text: August 2007
              Type: published
              Y: 2007
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              Value: 23
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              Value: 8
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