Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine.
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| Title: | Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine. |
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| Authors: | Burton, B. B., Lavoie, A. R., George, S. M. |
| Source: | Journal of the Electrochemical Society; Jul2008, Vol. 155 Issue 7, pD508-D516, 9p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2908741 |
