Atomic-scale redistribution of dopants in polycrystalline silicon layers.

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Bibliographic Details
Title: Atomic-scale redistribution of dopants in polycrystalline silicon layers.
Authors: Duguay, S., Colin, A., Mathiot, D.
Source: Journal of Applied Physics; Aug2010, Vol. 107 Issue 8, p034911-1-034911-7, 7p
Database: Applied Science & Technology Source
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