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Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.

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Title: Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.
Authors: Philippe, T., Duguay, S., Mathiot, D.
Source: Journal of Applied Physics; January 15 2011, Vol. 109 Issue 2, p023501-1-023501-4, 4p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501744280
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.
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  Data: <searchLink fieldCode="AU" term="%22Philippe%2C+T%2E%22">Philippe, T.</searchLink><br /><searchLink fieldCode="AU" term="%22Duguay%2C+S%2E%22">Duguay, S.</searchLink><br /><searchLink fieldCode="AU" term="%22Mathiot%2C+D%2E%22">Mathiot, D.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; January 15 2011, Vol. 109 Issue 2, p023501-1-023501-4, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501744280
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1063/1.3533416
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 023501-1
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      – TitleFull: Atomic scale evidence of the suppression of boron clustering in implanted silicon by carbon coimplantation.
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            NameFull: Philippe, T.
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            NameFull: Duguay, S.
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            NameFull: Mathiot, D.
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            – D: 15
              M: 01
              Text: January 15 2011
              Type: published
              Y: 2011
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              Value: 109
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